Hunan Jingtan Automation Equipment Co., LTD.

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Produk

Graphitization Furnace with 375L Loading Capacity 500x500x1500 Chamber Size and ±5℃ Temperature Uniformity for Semiconductor Purification

Rincian produk

Tempat asal: Hunan, Cina

Nama merek: Jingtan

Syarat Pembayaran & Pengiriman

Kuantitas min Order: 1

Harga: $56,000

Dapatkan Harga Terbaik

Hubungi Sekarang

Spesifikasi

Deskripsi

Spesifikasi

Menyoroti: 
                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                          375L Loading Capacity Graphitization Furnace, 500x500x1500 Chamber Size Purification Furnace, ±5℃ Temperature Uniformity Vacuum Sintering Machine
                                                  

Jenis:	Tungku Induksi	Voltase:	380
Berat:	5 T	Suhu batas:	2400℃
Metode pemanas:	Ketahanan pemanasan batang grafit	Model kontrol:	Manual atau otomatis
Suasana Kerja:	Perlindungan vakum atau gas inert	Kapasitas pemuatan:	375L
Ukuran Kamar:	5005001500	Keseragaman suhu:	±5℃
Struktur tungku:	horisontal	Bahan tubuh tungku:	SS 304
ZONA SUHU TINGGI:	5005001500	Perbedaan Suhu:	±5℃
Komponen inti:	PLC, Bejana tekan, Pompa, Silinder

Jenis:	Tungku Induksi
Voltase:	380
Berat:	5 T
Suhu batas:	2400℃
Metode pemanas:	Ketahanan pemanasan batang grafit
Model kontrol:	Manual atau otomatis
Suasana Kerja:	Perlindungan vakum atau gas inert
Kapasitas pemuatan:	375L
Ukuran Kamar:	5005001500
Keseragaman suhu:	±5℃
Struktur tungku:	horisontal
Bahan tubuh tungku:	SS 304
ZONA SUHU TINGGI:	5005001500
Perbedaan Suhu:	±5℃
Komponen inti:	PLC, Bejana tekan, Pompa, Silinder

Deskripsi

Graphitization Furnace with 375L Loading Capacity 500x500x1500 Chamber Size and ±5℃ Temperature Uniformity for Semiconductor Purification

Semiconductor Purification With Combination of Chemical and High Temperature Method Vacuum Sintering Heating Machine

Carbon Nanotube Purification Furnace

The combined purification treatment of high temperature method and chemical method. Suitable for new energy vehicles, semiconductors, new materials and many other fields.

Heat treatment of battery anode materials, powder metallurgy, nanomaterials, graphene, new materials and powder materials in vacuum atmosphere, and high temperature sintering and purification in an inert atmosphere.

Model	TCL-45	TCL-128	TCL-375	TCL-720	TCL-1568	TCL-2560	TCL-5000	TCL-7200	TCL-11700
High Temperature Zone (mm)	300300500	400400800	5005001500	6006002000	7007003200	8008004000	100010005000	120012005000	150015005200
Loading Capacity	45	128	375	720	1568	2560	5000	7200	11700
Temperature Difference	±5			±10			±15
Limit Temperature	2400
Heating Mode	resistance graphite rod heating
Control Model	manual or automatic operation
Working Atmosphere in the Furnace	vacuum or inert gas protection (micro positive pressure)

It can be used for high temperature graphitization purification of carbon nanotube materials, and can realize the purification treatment of high temperature method combined with chemical method.
It can realize continuous feeding and discharging at high temperature, reducing energy consumption and shortening production cycle.
Use resistance or induction heating, the temperature can reach 2400℃.
The combination of high temperature method and chemical method can meet the requirements of high purity treatment.
The efficient filtration system can effectively capture the dust and corrosive gases produced in the purification process.
It can realize continuous feeding and discharging at high temperature, reducing energy consumption and shortening production cycle.

Frequently Asked Questions

Are you a factory or trading company?

Yes, we are China leading high-temperature vacuum furnace manufacturer with 14+ years experience, granted with many patent certifications in the domestic market.

Do you have customization or OEM service?

Yes, we have powerful R&D team and high-tech equipment. We can supply both regular models and customizable furnaces according to client requirements.

What's your advantages?

Quick response to your enquiry
High quality control
Stable supply chain in the domestic market
Timely delivery
Excellent after-sales service, including engineer dispatch for installation and debugging

Contact Information

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Graphitization Furnace with 375L Loading Capacity 500x500x1500 Chamber Size and ±5℃ Temperature Uniformity for Semiconductor Purification

375L Loading Capacity Graphitization Furnace

500x500x1500 Chamber Size Purification Furnace

±5℃ Temperature Uniformity Vacuum Sintering Machine

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